A sputtering target is a high-purity material used as a source for sputtering – a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment. As a result of sputtering, a thin and durable coating is created on a substrate material. Vanadium sputtering targets, cast as thin discs or plates, are used in semiconductor, Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) display, and optical applications.

Vanadium Sputtering Target
SKU: V 009300 Category: Metals Tags: Natural resistance to corrosion, Stability against alkalis acids and salt water
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