Vanadium Sputtering Target

Vanadium Sputtering Target

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Metals

A sputtering target is a high-purity material used as a source for sputtering – a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment. As a result of sputtering, a thin and durable coating is created on a substrate material. Vanadium sputtering targets, cast as thin discs or plates, are used in semiconductor, Chemical Vapor Deposition (CVD), Physical Vapor Deposition (PVD) display, and optical applications.

See description of Vanadium metal here.