Vanadium Sputtering Target

Vanadium Sputtering Target

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Metals

A sputtering target is a high purity material used as a source for sputtering–a cold vaporization process in which atoms are physically removed from the target surface by ion bombardment. As a result of using a sputtering, a thin, durable and unmatched coating id created on a substrate material. Vanadium Sputtering Targets, cast as thin discos or plates, are Used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications.

See description of Vanadium metal here.